发明名称 LITHOGRAPHIC EQUIPMENT AND LIQUID REMOVING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a system for removing a liquid from a substrate table, in particular, from a gap between the substrate table and a substrate, and to provide a method therefor. <P>SOLUTION: In the liquid removing method, the liquid is removed from the substrate held on the substrate table and from the gap between the substrate and the substrate table. A liquid removing device is provided with at least one outlet port, forming a predetermined geometric long and thin extractor; the substrate table is moved relative to the liquid removing device so that the extractor passes all through the substrate and the gap; and that the local tangent in the local portion of the extractor at the end of non-dry portion in the gap substantially holds the angle between about 35&deg; and 90&deg; on a planar view, at arbitrary times with respect to that in the gap. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008205465(A) 申请公布日期 2008.09.04
申请号 JP20080032818 申请日期 2008.02.14
申请人 ASML NETHERLANDS BV 发明人 JACOBS HERNES;LOOPSTRA ERIK R;RIEPEN MICHEL;MONDT EVA
分类号 H01L21/027 主分类号 H01L21/027
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