| 摘要 |
PROBLEM TO BE SOLVED: To conduct defect inspection of the lower surface of a sample, in addition to defect inspection of the upper surface of the sample. SOLUTION: A defect inspection apparatus includes: an upper-surface inspection section that makes it possible to change at least either one of an angle, at which upper-surface illuminating means illuminates a substrate with a light, or an angle, at which a upper-surface imaging means photographs the image of the substrate, and that serves to inspect an upper surface of the substrate; a back-surface inspection section that has a moving means for use in inspection of a back surface of the substrate, where the moving means releasably holding the back surface of the substrate to uniaxially move the substrate that makes it possible to change, at least either one of an angle, at which lower-surface illuminating means illuminates the substrate, with a light, or an angle, at which back-surface imaging means takes the image of the substrate, and that serves to inspect the back surface of the substrate; and a control section that processes image data, obtained from the upper-surface inspection section, with respect to the upper surface of the substrate and image data obtained from the back-surface inspection section with respect to the back surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT |
