| 摘要 |
PROBLEM TO BE SOLVED: To provide an adjusting method for a charged particle beam apparatus and a charged particle optical system, by which method the charged particle optical system can be adjusted easily and precisely in a short time. SOLUTION: The charged particle beam apparatus 1 includes a charged particle source 9, the charged particle optical systems 12 and 16 which set a charged particle beam I to a characteristic value corresponding to an input value and cause the set charged particle beam I to fall onto a sample, a scanning means 17 capable of relatively moving the emission position of the charged particle beam I, an observing means 32 capable of taking an image, and a control unit 30. The control unit 30 has a spot pattern forming means 33 which sets input values to different values and causes the charged particle beam I to fall on the sample several times at different positions to form a plurality of spot patterns, and a spot pattern analyzing means 34 which selects a spot pattern whose spot characteristic value is the minimum. An input value to the charged particle optical systems 12 and 16 is determined to be equal to the input value that corresponds to the selected spot pattern. COPYRIGHT: (C)2008,JPO&INPIT
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