| 摘要 |
Device ( 1 ) for applying a liquid dopant solution on a wafer ( 3 ), comprising a dopant distribution device ( 5 ), a rotatable horizontally translatable dopant-transfer roll ( 7 ) between a first roll position ( 15 ) and a second roll position, and a work table ( 9 ) for holding the wafer ( 3 ), wherein the distribution device ( 5 ) comprises a dopant-transfer block ( 20 ) and a fluid container ( 24 ) having an open side enclosed by an edge ( 26 ), which open side is directed to the dopant-transfer block ( 20 ), wherein the block holder ( 21 ) is horizontally translatable between a first block position in which the dopant-transfer block is under the open side of the fluid container and a second block position ( 31 ) in which the dopant-transfer block ( 20 ) has contacted the rotatable dopant-transfer roll ( 7 ) in its first roll position ( 15 ), wherein during normal operation in the second roll position the rotatable dopant-transfer roll ( 7 ) has contacted the wafer ( 3 ) to provide dopant solution onto the surface of the wafer ( 3 ).
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