| 摘要 |
<p>A stage system for a lithographic system is provided to realize improved dynamic quality even under external disturbance, thereby improving the through-put of a lithographic system. A stage system for a lithographic system comprises: a stage(ST); a plurality of actuators designed to act on the stage and over-determined in a degree of freedom of the actuators; at least two sensors measuring each position dependent parameter of the stage, providing individual sensor signals, and disposed to measure each position dependent parameter in a degree of freedom of the sensors; a controller(Cpos) designed to provide a controller output signal(COS) to at least one of the actuators in response to the position dependent parameter measured by at least one of the sensors and set point(r); and an additional controller(Cdamp) to which the position dependent parameters measured by at least two sensors are provided, wherein the additional controller determines the difference between the position dependent parameter measured by at least two sensors and is designed to provide an additional controller output signal(FCOS) to at least one of the actuators in response the difference.</p> |
