| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface treating agent for a freezing process by which when a first resist pattern is formed on a first resist film, a second resist film is formed on the first resist pattern and in order to form a second resist pattern, the first resist pattern is chemically treated to change properties so that it is not dissolved in a second resist liquid, wherein the surface treating agent is used for chemically treating the first resist pattern so as to satisfy the requirements that the first resist pattern does not dissolve in the second resist liquid, the dimensions of the first resist pattern undergo no change, and the first and second resist patterns have the same dry etching resistance, and a pattern forming method using the surface treating agent. <P>SOLUTION: The surface treating agent for pattern formation contains a polyhydric alcohol compound. The pattern forming method using the surface treating agent is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
