发明名称 |
Method of removing silicon oxide from a surface of a substrate |
摘要 |
A method for removing silicon oxide from a surface of a substrate is disclosed. The method includes depositing material onto the silicon oxide (110) and heating the substrate surface to a sufficient temperature to form volatile compounds including the silicon oxide and the deposited material (120). The method also includes heating the surface to a sufficient temperature to remove any remaining deposited material (130).
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申请公布号 |
US6806202(B2) |
申请公布日期 |
2004.10.19 |
申请号 |
US20020309500 |
申请日期 |
2002.12.03 |
申请人 |
MOTOROLA, INC. |
发明人 |
HU XIAOMING;CRAIGO JAMES B.;DROOPAD RAVINDRANATH;EDWARDS, JR. JOHN L.;LIANG YONG;WEI YI;YU ZHIYI |
分类号 |
H01L21/306;(IPC1-7):H01L21/461;H01L21/476 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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