TEMPERATURE CONTROLLED SUBSTRATE HOLDER WITH NON-UNIFORM INSULATION LAYER FOR A SUBSTRATE PROCESSING SYSTEM
摘要
A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, and a substrate support opposing the temperature controlled support base and configured to support the substrate. Also included is one or more heating elements coupled to the substrate support and configured to heat the substrate support to a second temperature above the first temperature, and a thermal insulator disposed between the temperature controlled support base and the substrate support. The thermal insulator includes a non-uniform spatial variation of the heat transfer coefficient (W/m<SUP>2</SUP>-K) through the thermal insulator between the temperature controlled support base and the substrate support.
申请公布号
WO2008039611(A3)
申请公布日期
2008.09.04
申请号
WO2007US76179
申请日期
2007.08.17
申请人
TOKYO ELECTRON LIMITED;STRANG, ERIC, J.;TSUKAMOTO, YUJI