发明名称 NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT AND NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory element and a nonvolatile semiconductor memory device, enabling both miniaturization and multiple value coding. <P>SOLUTION: The nonvolatile semiconductor memory element and nonvolatile semiconductor memory device contain a transistor 1 which comprises: a semiconductor substrate 2; a source region 4a and a drain region 4b formed apart on the semiconductor substrate; and a gate structure which has: a tunnel insulating layer 6 formed on the semiconductor substrate between the source region and the drain region; a resistance change layer 8 of a metal oxide formed on the tunnel insulating layer; and a first electrode 10 formed on the resistance change layer. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008205191(A) 申请公布日期 2008.09.04
申请号 JP20070039633 申请日期 2007.02.20
申请人 TOSHIBA CORP 发明人 TAKASHIMA AKIRA;MURAOKA KOICHI
分类号 H01L27/10 主分类号 H01L27/10
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