发明名称 X-RAY ANALYSIS APPARATUS AND X-RAY ANALYSIS METHOD
摘要 PROBLEM TO BE SOLVED: To achieve a stable behavior of an X-ray source, and stably implement quantitative analysis in an X-ray analysis apparatus, and to provide an X-ray analysis method. SOLUTION: The X-ray analysis apparatus comprises an X-ray lamp 3 for irradiating a sample 1 with a primary X rays; a primary X-ray adjustment mechanism 4 for adjusting the intensity of the primary X rays; an X-ray detector 5 for detecting the characteristic X rays emitted from the sample 1, and outputting a signal that contains energy information on the characteristic X rays and scattered X rays; an analyzer 6 for analyzing the signal; and an incident X-ray adjusting mechanism 7, disposed in between the sample 1 and the X-ray detector 5 and can adjust the total intensity of the characteristic X rays and the scattered X rays that enter the X-ray detector 5. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008203245(A) 申请公布日期 2008.09.04
申请号 JP20070331546 申请日期 2007.12.25
申请人 SII NANOTECHNOLOGY INC 发明人 FUKAI TAKAYUKI;MATOBA YOSHITAKE;HASEGAWA KIYOSHI
分类号 G01N23/223;G21K1/04 主分类号 G01N23/223
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