发明名称 Gated fabrication of nanostructure field emission cathode material within a device
摘要 Gated field emission devices and systems and methods for their fabrication are described. A method includes growing a substantially vertically aligned carbon nanostructure, the substantially vertically aligned carbon nanostructure coupled to a substrate; covering at least a portion of the substantially vertically aligned carbon nanostructure with a dielectric; forming a gate, the gate coupled to the dielectric; and releasing the substantially vertically aligned carbon nanostructure by forming an aperture in the gate and removing a portion of the dielectric.
申请公布号 US6858455(B2) 申请公布日期 2005.02.22
申请号 US20020155841 申请日期 2002.05.24
申请人 UT-BATTELLE, LLC 发明人 GUILLOM MICHAEL A.;SIMPSON MICHAEL L.;MERKULOV VLADIMIR I.;MELECHKO ANATOLI V.;LOWNDES DOUGLAS H.
分类号 B81C1/00;H01J9/02;(IPC1-7):H01L21/00 主分类号 B81C1/00
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