发明名称 SUBSTRATE PROCESSING APPARATUS AND FOCUS RING
摘要 A substrate processing apparatus that can reliably improve the efficiency of heat transfer between a focus ring and a mounting stage. A housing chamber with the interior thereof evacuated houses a substrate. The substrate is mounted on a mounting stage that is disposed in the housing chamber. An annular focus ring is mounted on the mounting stage such as to surround a peripheral portion of the mounted substrate. A heat transfer film is formed on a surface of the focus ring which contacts the mounting stage by printing processing.
申请公布号 US2008210379(A1) 申请公布日期 2008.09.04
申请号 US20080016607 申请日期 2008.01.18
申请人 TOKYO ELECTRON LIMITED 发明人 MIYAGAWA MASAAKI;NISHIMURA EIICHI
分类号 H01L21/3065 主分类号 H01L21/3065
代理机构 代理人
主权项
地址