| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a graft pattern forming method for forming a pattern in which a boundary between a graft polymer production area and a graft polymer nonproduction area is clear. <P>SOLUTION: The graft pattern forming method includes: a step of imagewise irradiating a curable layer formed on a support with visible light to form a cured portion and an uncured portion in the curable layer, wherein the curable layer contains (a) a sensitizer having absorption in a visible range, (b1) a polymerization initiator which is sensitized by the sensitizer, (b2) a polymerization initiator which is not sensitized by the sensitizer and (c) a compound having a polymerizable unsaturated bond; a step of removing the uncured portion of the curable layer by development to form a pattern by the residual portion of the curable layer and the exposed portion of the support; and a step of irradiating the pattern with ultraviolet light after bringing a graft polymer precursor into contact with the top of the pattern to produce a graft polymer on the residual portion of the curable layer, whereby a graft pattern comprising a graft polymer production area and a graft polymer nonproduction area is formed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
