发明名称 Medium For Etching Oxidic, Transparent, Conductive Layers
摘要 The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas.
申请公布号 US2008210660(A1) 申请公布日期 2008.09.04
申请号 US20060994608 申请日期 2006.06.08
申请人 MERCK PATENT GESELLSCHAFT 发明人 STOCKUM WERNER;KUEBELBECK ARMIN
分类号 H01B13/00;B29D11/00;B44C1/22;C03C14/00;C03C25/68;C09K13/00;C23F1/02;C23F1/10 主分类号 H01B13/00
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