发明名称 METHOD FOR FORMING SrTiO3 FILM AND STORAGE MEDIUM
摘要 <p>A substrate is arranged in a processing chamber, the substrate is heated, and an Sr material, a Ti material and an oxidizing agent are introduced into the processing chamber in the form of gas, the gases are reacted on the heated substrate, and an SrTiO&lt;SUB&gt;3&lt;/SUB&gt; film is formed on the substrate. As the Sr material, an Sr amine compound or an Sr imine compound is used.</p>
申请公布号 WO2008105451(A1) 申请公布日期 2008.09.04
申请号 WO2008JP53391 申请日期 2008.02.27
申请人 TOKYO ELECTRON LIMITED;KAKIMOTO, AKINOBU;KAWANO, YUMIKO 发明人 KAKIMOTO, AKINOBU;KAWANO, YUMIKO
分类号 H01L21/316;C23C16/40;C23C16/455;C23C16/52 主分类号 H01L21/316
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