| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern-forming material which is high in engraving sensitivity and efficiently engravable with low laser energy and gives excellent resolution. <P>SOLUTION: The pattern-forming material has, on its base material, a layer which includes a polymer having at least one site represented by -C(R<SP>1</SP>)=N-O- (wherein R<SP>1</SP>is a hydrogen atom or a monovalent organic group) in its molecule. <P>COPYRIGHT: (C)2008,JPO&INPIT |
