| 摘要 |
<p>A plasma processing apparatus is provided to remove effectively photoresist from a substrate by reducing non-uniformity of a substrate or a substrate holding unit. A decompression vessel(210) is formed to define an internal space for generating plasma. A plasma generator(220) is formed to generate the plasma. An upper plate(230) is positioned under the plasma generator. The upper plate includes at least two or more dielectric plates(235). A substrate holding unit(240) is positioned in the inside of the decompression vessel in order to prevent non-uniformity of temperature caused by the separation of the dielectric plates. The substrate holding unit includes a lower electrode(242) arranged on a substrate, a heating part(246) arranged in a space between the dielectric plates in order to compensate the non-uniformity of the temperature of the lower electrode, and a base part(244) positioned under the lower electrode.</p> |
