发明名称 |
FOCUS MONITORING MASK HAVING MULTI-PHASE PHASE SHIFTER AND METHOD FOR FABRICATING THE SAME |
摘要 |
A focus monitoring mask includes a transparent substrate, e.g., a quartz layer. A light blocking film, e.g., a chromium-containing film, is disposed on the transparent substrate and has an opening therein. A transparent unit is disposed in a portion of the substrate exposed by the opening. The transparent unit includes a first phase shifter, a second phase shifter and a third phase shifter arranged adjacently in order of amount of phase shift. The second phase shifter is configured to provide an about 180° phase difference with respect to the first phase shifter. The third phase shifter is configured to provide a phase difference other than about 0° and about 180° with respect to the first phase shifter. The transparent unit may further include a fourth phase shifter having a fourth phase difference with respect to the first phase shifter that differs from about 0°, about 180° and the phase difference provided by the third phase shifter. |
申请公布号 |
KR20060060156(A) |
申请公布日期 |
2006.06.05 |
申请号 |
KR20040099055 |
申请日期 |
2004.11.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, SUNG WON;LEE, SUK JOO;KIM, HO CHUL;CHO, HAN KU;WOO, SANG GYUN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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