发明名称 IMPROVED SPUTTER TARGET UTILIZATION
摘要 An apparatus and method are provided for improved utilization of a sputter target in the longitudinal end regions. The focus of erosion in the end regions is widened, thereby extending the useful life of the target. This provides improved efficiency and reduces waste because a greater proportion of the target material in the more expansive central region can be harvested, because the target is utilized for a longer period of time.
申请公布号 KR20080080365(A) 申请公布日期 2008.09.03
申请号 KR20087017014 申请日期 2008.07.11
申请人 OC OERLIKON BALZERS AG 发明人 SCHNEIDER STEFAN;MULLER MARCEL;VYSKOCIL JIRI;WAGNER ISRAEL
分类号 C23C14/35;C23C14/34 主分类号 C23C14/35
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