| 摘要 |
This invention provides a substrate with an electrically conductive film for an EUV mask blank having enhanced surface hardness, and a substrate with a multilayer reflection film and an EUV mask blank using the substrate with an electrically conductive film. The substrate with an electrically conductive film is adapted for use in the production of a reflection-type mask blank for EUV lithography and is characterized in that the electrically conductive film is formed of at least one material selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V and contains B (boron) in an average concentration of 1 to 70 at%. |
