| 摘要 |
Provided is a plasma treatment apparatus capable of preventing an unnecessary sticking film from being deposited in a treatment container using plasma. The plasma treatment apparatus (32) comprises a treatment container (34) having an opened ceiling portion (54a), side walls (34a) and a bottom portion (34b) and made internally evacuative, a placing bed (36) mounted in the treatment container (34) for placing a work (W) thereon, a ceiling plate (54) mounted gastight in the ceiling portion (54a) and made of a dielectric material for transmitting a microwave therethrough, a planar antenna member (58) mounted on the upper face of the ceiling plate (54) for introducing the microwave into the treatment container, microwave feeding means (60) for feeding the microwave to the planar antenna member, and gas introducing means (44) for introducing a necessary treatment gas, into the treatment container (34). This treatment container (34) is provided therein with film stick preventing means (78) made of a dielectric material and so extending from the ceiling plate (54) as to correspond to the portion, on which the unnecessary sticking film is easily deposited. The film stick preventing means (78) is made of a rod-shaped member (104).
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