发明名称 PLUGGING METHOD OF VIA HOLE
摘要 A method for plugging a via hole is provided to improve a charging characteristic of plugging ink to a via hole by forming concavo-convex parts through a plasma process. A substrate plating process is performed to form a plating layer on an inner wall surface of a via hole by plating a substrate(S100). A substrate plasma process is performed to form concavo-convex parts on the plating layer(S200). An ink charging process is performed to fill the via hole with plugging ink(S300). A surface polishing process is performed to polish a surface of the substrate. The process for forming the concavo-convex parts includes a selective plasma process for forming the concavo-convex parts on the plating layer of the via hole.
申请公布号 KR100855622(B1) 申请公布日期 2008.09.03
申请号 KR20070087287 申请日期 2007.08.29
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK, JONG WON
分类号 H01L21/28 主分类号 H01L21/28
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