| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device that can perform uniform plasma processing on the surface of a workpiece. <P>SOLUTION: The plasma processing device generates a plasma (P) in a chamber (10) and performs plasma processing by applying a plasma product (A) generated from the plasma onto the surface of the workpiece (W). In addition, the plasma processing device is provided with a shielding body (40) that partly shields a space wherein the plasma product dispersing toward the surface of the workpiece is formed. <P>COPYRIGHT: (C)2004,JPO |
