| 摘要 |
A method, apparatus, and a system for performing an adaptive state estimation process for processing semiconductor wafers. A processing of a first workpiece is controlled using a process controller (305) and a processing tool (310). Manufacturing data relating to the processing of the first workpiece is acquired. Status data relating to the manufacturing data is acquired. The status data includes data relating to the source of the manufacturing data. A state of a process controller (305) or a processing tool (310) is determined based upon the status data and the manufacturing data. |
