发明名称 METHOD AND APPARATUS FOR DEFECT INSPECTING, AND COMPUTER PROGRAM
摘要 PROBLEM TO BE SOLVED: To perform accurate inspection by capturing images of high accuracy, that have no image distortions, when the images of a substrate are to be captured by the relative movement of a mounting base, to which the substrate is mounted and an imaging device. SOLUTION: A wafer W on the mounting base 112 is imaged by the imaging device 122 in an imaging unit 120, which is driven by a driving device 127 to move. The driving device 127 is controlled by drive signals from a first control device 131. The drive signals, outputted to the first control device 131, are also outputted to a second control device 132. The second control device 132 controls the imaging device 122 on the basis of the drive signals. The movement of the imaging device 122 itself and imaging by the imaging device 122 are synchronized. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007240519(A) 申请公布日期 2007.09.20
申请号 JP20070002440 申请日期 2007.01.10
申请人 TOKYO ELECTRON LTD 发明人 HAYAKAWA MAKOTO;TOMITA HIROSHI
分类号 G01N21/956;G01B11/30;H01L21/66 主分类号 G01N21/956
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