发明名称 |
GLASS SUBSTRATE HAVING CIRCUIT PATTERN AND PROCESS FOR PRODUCING THE SAME |
摘要 |
<p>The invention provides a process for producing a glass substrate (10) having a circuit pattern (26), which includes a circuit pattern formation step of forming a thin film layer (12) on a glass substrate and then irradiating the thin film layer with laser light (22) to form a circuit pattern on the glass substrate; a low-melting point glass deposition step of depositing a low-melting point glass (28) having a softening point of from 450 to 630 °C on the glass substrate having the circuit pattern formed thereon; and a sintering step of sintering the low-melting point glass to form a low-melting point glass layer (32) comprising the low-melting point glass sintered on the glass substrate having the circuit pattern formed thereon and to form a compatible layer (34) between the glass substrate and the low-melting point glass layer.</p> |
申请公布号 |
EP1965616(A1) |
申请公布日期 |
2008.09.03 |
申请号 |
EP20060834921 |
申请日期 |
2006.12.18 |
申请人 |
ASAHI GLASS CO., LTD. |
发明人 |
SATOH, RYOHEI;NAKAGAWA, KOJI;USUI, REO;TANAKA, KENJI;TAKAKI, SATORU;EBATA, KENICHI;AOKI, YUMIKO |
分类号 |
H05K3/08;G03F7/20;H01J9/02;H01J11/02;H01J11/22;H01J11/24;H01J11/34;H05K3/28 |
主分类号 |
H05K3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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