发明名称 GLASS SUBSTRATE HAVING CIRCUIT PATTERN AND PROCESS FOR PRODUCING THE SAME
摘要 <p>The invention provides a process for producing a glass substrate (10) having a circuit pattern (26), which includes a circuit pattern formation step of forming a thin film layer (12) on a glass substrate and then irradiating the thin film layer with laser light (22) to form a circuit pattern on the glass substrate; a low-melting point glass deposition step of depositing a low-melting point glass (28) having a softening point of from 450 to 630 °C on the glass substrate having the circuit pattern formed thereon; and a sintering step of sintering the low-melting point glass to form a low-melting point glass layer (32) comprising the low-melting point glass sintered on the glass substrate having the circuit pattern formed thereon and to form a compatible layer (34) between the glass substrate and the low-melting point glass layer.</p>
申请公布号 EP1965616(A1) 申请公布日期 2008.09.03
申请号 EP20060834921 申请日期 2006.12.18
申请人 ASAHI GLASS CO., LTD. 发明人 SATOH, RYOHEI;NAKAGAWA, KOJI;USUI, REO;TANAKA, KENJI;TAKAKI, SATORU;EBATA, KENICHI;AOKI, YUMIKO
分类号 H05K3/08;G03F7/20;H01J9/02;H01J11/02;H01J11/22;H01J11/24;H01J11/34;H05K3/28 主分类号 H05K3/08
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