| 摘要 |
A shape profile measuring unit enabling the high-precision measurement of a fine pattern at a short wavelength by providing a scatterometory device that resolves an oblique incidence problem when a reflection type object lens is used and a chromatic aberration problem when a reflection type object lens is used. A shape profile measuring unit for measuring a shape profile by matching an actually measured spectral waveform with a simulation waveform, wherein one concave mirror (21) and one convex mirror (22) are used as an imaging system, and an optical system under which an object side and an image side are on the same side with respect to the concave mirror (21), that is, an Ophner type is used as a reflection type object lens to be able to realize a vertical incidence and detect only a vertical reflection component, whereby a simulation waveform can be matched with an actually measured waveform, and a high-precision measurement is possible at a short wavelength. |
