Measurement apparatus, exposure apparatus, and device fabrication method

摘要

The present invention provides a measurement apparatus that includes a measurement unit inserted on an image plane of an optical system to be measured, and a measurement mask inserted on an object plane of the optical system to be measured, said measurement unit including a light-shielding board including a slit-like image-side opening part, and said measurement mask including a rectangular light-shielding part being configured to form a projection image having a longitudinal dimension and lateral dimension longer than a longitudinal dimension and lateral dimension of said image-side opening part on the image plane of the optical system to be measured, and object-side opening parts formed on two sides of said light-shielding part, wherein said measurement apparatus measures flare generated by the optical system to be measured by measuring a light quantity by said light quantity sensor while the projection image covers said image-side opening part.