发明名称 |
Holographically defined surface mask etching method and etched optical structures |
摘要 |
The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as ebeam lithography, is used to define defects and functional elements, such as waveguides and cavities.
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申请公布号 |
US7421158(B2) |
申请公布日期 |
2008.09.02 |
申请号 |
US20050521425 |
申请日期 |
2005.03.22 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
FAINMAN YESHAIAHU;NAKAGAWA WATARU;CHEN CHYONG-HUA;SUN PANG-CHEN;PANG LIN |
分类号 |
G02B6/26;G02B;G02B6/12;G02B6/255;G02B27/42;G02F1/295;G03F7/00;G03F7/20;G03F7/40;H01L21/00 |
主分类号 |
G02B6/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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