| 摘要 |
<p>An exposure apparatus is provided to obtain correctly an offset value of high precision by modifying and improving a structure thereof. A projection optic system is formed to project light from a reticle onto a substrate. A detector is formed to detect a position of a surface of the substrate in an optical axis direction of the projection optic system. The reticle and the substrate are moved in a scanning direction crossing the optical axis, in order to detect the position of the surface, to subtract an offset value from the detected position, to move the substrate in the optical axis direction based on the subtraction value, and to expose the substrate to light through the reticle and the projection optic system. The offset value is obtained by calculating a line or a surface for approximating a plurality of positions of the surface and a difference between the position of the surface and the position of the line or surface in the optical axis direction, and averaging the differences.</p> |
