发明名称 Phase changeable memory device and method of formation thereof
摘要 In a phase changeable memory device and a method of formation thereof, the phase changeable memory device comprises: a lower electrode pattern on an interlayer insulating layer; an insulating pattern located on the lower electrode pattern; a phase changeable pattern penetrating the insulating pattern and the lower electrode pattern to contact the lower electrode pattern and the interlayer insulating layer; and an upper electrode on the phase changeable pattern.
申请公布号 US7419881(B2) 申请公布日期 2008.09.02
申请号 US20050252807 申请日期 2005.10.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO BYEONG-OK;JOO SUK-HO;RYOO KYUNG-CHANG;BYUN KYUNG-RAE
分类号 H01L21/20 主分类号 H01L21/20
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