发明名称 Method for producing single electron semiconductor element
摘要 The present invention provides a method for production of a single electron semiconductor element (SET) in which a quantum dot is selectively arranged in a nano gap between fine electrodes, whereby the product yield is significantly improved, leading to excellent practical applicability. The method for production of SET of the present invention is characterized in that a solution containing ferritin including a metal or semiconductor particle therein, and a nonionic surfactant is dropped on a substrate having a source electrode and a drain electrode formed by laminating a titanium film and a film of a metal other than titanium, whereby the ferritin is selectively arranged in a nano gap between the source electrode/drain electrode.
申请公布号 US7419849(B2) 申请公布日期 2008.09.02
申请号 US20060878691 申请日期 2006.11.28
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 KUMAGAI SHINYA;YOSHII SHIGEO;MATSUKAWA NOZOMU;YAMASHITA ICHIRO
分类号 H01L51/40 主分类号 H01L51/40
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