发明名称 Two-port dual-gate HEMT for discrete device application
摘要 A two-port dual-gate field-effect transistor for amplifier applications, wherein a self-bias circuit includes a number of passive elements, such as resistors, diodes and capacitors, is utilized to coupled the output of the amplifier with a second gate of the dual-gate device as a bias source, which transforms the conventional three-port cascade topology into a two-port dual-gate device so as to facilitate device testing, modeling, and packaging for discrete device application. The technology improves the RF performance in conventional two-port single-gate HEMT devices, with slight noise figure degradation.
申请公布号 US7420417(B2) 申请公布日期 2008.09.02
申请号 US20060446204 申请日期 2006.06.05
申请人 WIN SEMICONDUCTORS CORP. 发明人 LIN CHENG-KUO;CHANG WEI-DER;WANG YU-CHI
分类号 H03F3/16 主分类号 H03F3/16
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