SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing apparatus is provided with a process chamber for processing a substrate; a heating apparatus for optically heating the substrate stored in the process chamber from the outer circumference side of the substrate; a cooling apparatus for cooling the outer circumference side of the substrate by flowing a fluid in the vicinity of the outer circumference of the substrate to be optically heated by the heating apparatus; a temperature detecting section for detecting the temperature in the processing chamber; and a heating control section for controlling the heating apparatus and the cooling apparatus to have a temperature difference between the center portion and the end portion of the substrate by maintaining the temperature at the center portion of the substrate at a prescribed temperature, based on the temperature detected by the temperature detecting section.