发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 <p>A substrate processing apparatus is provided to prevent damage of a substrate by removing interference with barrier ribs and supporting stably the substrate. A process chamber(102) performs operations for processing a substrate(10). A substrate transfer unit transfers the substrate in a horizontal direction within the process chamber. A barrier rib(104) is formed to divide the process chamber into a plurality of process spaces(102a,102b). The substrate penetrates an entrance(104a) of the barrier rib. A plurality of supporting units(130) are arranged adjacently to the barrier rib to support the substrate. Each of the supporting unit includes a cylinder, cylinder rod, and a sliding member. The cylinder is disposed in the process chamber and includes an internal space. The cylinder rod is disposed in an internal space of the cylinder. The sliding member is coupled with an upper part of the cylinder rod and comes in contact with a bottom surface of the substrate.</p>
申请公布号 KR20080079893(A) 申请公布日期 2008.09.02
申请号 KR20070020500 申请日期 2007.02.28
申请人 SEMES CO., LTD. 发明人 KIM, SOO HUYCK;KIM, CHAN JUNG
分类号 H01L21/304;H01L21/677;H01L21/683 主分类号 H01L21/304
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