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发明名称
Method for detecting end point of plasma etching process
摘要
申请公布号
KR100855496(B1)
申请公布日期
2008.09.01
申请号
KR20060055958
申请日期
2006.06.21
申请人
发明人
分类号
H01L21/3065;H01L21/66
主分类号
H01L21/3065
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代理人
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