| 摘要 |
<p>A roll patterning apparatus is provided to align correctly a roll and a mask by moving a supporting plate including the mask and a light source lamp to a stage. A roll(100) as a patterning target is loaded into a chuck(10). A roll motor(20) is formed to rotate the roll. A supporting plate(30) is formed at one side of the roll to support a mask(200). A light source lamp(300) is installed at the supporting plate. The light source lamp is installed at an opposite side of the roll on the basis of the mask. A stage(40) is formed to move the mask in x, y, and z axis directions with respect to the roll. The chuck includes a first and second chucks(11,12) which are positioned at both ends of a longitudinal direction of the roll.</p> |
