Strontium silylamides, adducts thereof with Lewis bases, preparation thereof and deposition of strontium thin films
摘要
<p>Compound of the formula (I):
wherein R represents a radical chosen from methyl or ethyl, and n is an integer equal to 1, 2 or 3. Its use in semiconductor manufacturing, as a thin film precursor and a method of its deposition on a substrate.</p>
申请公布号
EP1961755(A1)
申请公布日期
2008.08.27
申请号
EP20070300805
申请日期
2007.02.21
申请人
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
