发明名称 VACUUM DEPOSITION DEVICE AND METHOD OF FILM PRODUCTION BY VACUUM DEPOSITION
摘要 FIELD: machine building. ^ SUBSTANCE: invention relates to the device and method of vacuum deposition designed to deposit films in vacuum onto a substrate film and can be used in machine building branches. The device incorporates a substrate film feed roller, a roller to guide the substrate film into vacuum, a covering roller for the substrate film to run around and get a vacuum-deposited layer with a film with covering, a receiving roller to reel on the film with covering and receiving-guiding roller to retain the vacuum-deposited film with covering layer fed from the covering roller. The device timing appliance allows balancing the velocity of covering roller periphery V1 and velocity of guiding roller periphery V2 so that V1=V2. ^ EFFECT: elimination of scratching of vacuum-deposited layer. ^ 10 cl, 16 dwg
申请公布号 RU2332523(C2) 申请公布日期 2008.08.27
申请号 RU20050120006 申请日期 2003.12.26
申请人 TOPPAN PRINTING KO., LTD.;EHPPLAJD MATIRIEHLS GMBKH UND KO.KG 发明人 SASAKI NOBORU;SUZUKI KHIROSI;KOIZUMI FUMITAKE;IMAJ NOBUKHIKO;ARAJ KUNIMASA;KONAGAJ KHIROJUKI
分类号 C23C14/56;C23C16/54 主分类号 C23C14/56
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