| 摘要 |
An apparatus for cleansing substrates is provided to reduce the discharge speed and amount of gas by extending the path and time to discharge mist. An apparatus for cleansing substrates comprises a chamber(110), a substrate transfer part(200), a fluid spray part(300), an exhaust pipe(400), and a plurality of exhaust control plates(450). The substrate transfer part comprises transfer rollers(212) to convey a substrate(10). The fluid spray part sprays fluids on the substrate. The exhaust pipe, vertically installed at the lower part of the chamber, exhausts gas which is generated from the sprayed fluids. The exhaust control plates, separately installed in the exhaust pipe, adjust the displacement of the gas. The inlet of the exhaust pipe is installed below the transfer rollers. |
