| 摘要 |
<p>An exposure device, a preparation system containing the exposure device, and a method for preparing a device by using the exposure device are provided to reduce the variation of line width of a resist pattern between shot regions. An exposure device(102) comprises an exposure part(102c) which exposes a photoresist coated on a substrate per a shot region to transfer the pattern of a mask to the photoresist; and a control part(102b) which obtains the exposure amount of the each shot region based on the lithography schedule of the each shot region and allows the exposure process to be carried out at the each shot region of the exposure part according to the obtained exposure amount.</p> |
