发明名称 |
VERTICAL SPIN TRANSISTOR AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To propose a spin transistor having a new structure and its manufacturing method. SOLUTION: The vertical spin transistor is provided with a first source drain layer including a layer made of magnetic substance; a projection structure including a channel layer that is formed on the first source drain layer and includes a layer made of semiconductor and a second source drain layer that is formed on the channel layer and includes a layer made of magnetic substance; a gate insulation film formed on the side face of the channel layer; and a gate electrode formed on the surface of the gate insulation film. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008226901(A) |
申请公布日期 |
2008.09.25 |
申请号 |
JP20070058782 |
申请日期 |
2007.03.08 |
申请人 |
TOSHIBA CORP |
发明人 |
SUGIYAMA NAOHARU;SAITO YOSHIAKI |
分类号 |
H01L29/82;H01L21/8234;H01L21/8246;H01L27/08;H01L27/088;H01L27/105;H01L29/12;H01L29/78;H01L29/786 |
主分类号 |
H01L29/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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