发明名称 VERTICAL SPIN TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To propose a spin transistor having a new structure and its manufacturing method. SOLUTION: The vertical spin transistor is provided with a first source drain layer including a layer made of magnetic substance; a projection structure including a channel layer that is formed on the first source drain layer and includes a layer made of semiconductor and a second source drain layer that is formed on the channel layer and includes a layer made of magnetic substance; a gate insulation film formed on the side face of the channel layer; and a gate electrode formed on the surface of the gate insulation film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008226901(A) 申请公布日期 2008.09.25
申请号 JP20070058782 申请日期 2007.03.08
申请人 TOSHIBA CORP 发明人 SUGIYAMA NAOHARU;SAITO YOSHIAKI
分类号 H01L29/82;H01L21/8234;H01L21/8246;H01L27/08;H01L27/088;H01L27/105;H01L29/12;H01L29/78;H01L29/786 主分类号 H01L29/82
代理机构 代理人
主权项
地址