| 摘要 |
A preparation method of a colloidal solution for a metal oxide thin film is provided, wherein the colloidal solution is excellent in transparency and crystallinity, has a very large specific surface area due to nano-sized particles, does not contain a binder for coating, does not require a sintering process for crystallization at high temperatures, and reduce the preparation cost by coating the colloidal solution through one system. A preparation method of a colloidal solution containing ultrafine metal oxides by a Solvothermal process comprises: adding 10 ml of a metal oxide precursor to a mixed solution of distilled water and 100 to 200 ml of an alcohol-based organic solvent with a low molecular weight containing a hydroxyl group; adding a small amount of a silicon-based inorganic additive to a mixed solution; highly dispersing the mixture by an ultrasonic treater to obtain a mixed sol solution; and heat-treating the mixed sol solution at 200 deg.C and a pressure of 10 to 30 atmospheric pressures in a nitrogen atmosphere within a reaction with a high temperature and a high pressure. The distilled water is added in the amount corresponding to two moles per one mole of the metal oxide precursor, and the silicon-based inorganic additive is added in the amount corresponding to 1 to 5% by weight of the total solution weight. |
