发明名称 SUBSTRATE TREATMENT DEVICE, TWO-FLUID NOZZLE, AND LIQUID DROPLET SUPPLY METHOD
摘要 PROBLEM TO BE SOLVED: To enhance the atomization of the liquid droplets in a liquid droplet supply method for supplying liquid droplets of pure water formed with the collision of the pure water with nitrogen gas, a two-fluid nozzle for supplying the liquid droplets, and a substrate treatment device for applying substrate treatment with the liquid droplets supplied to a substrate. SOLUTION: The pure water is discharged from a liquid discharge port 342 and the nitrogen gas is discharged from gas discharge ports 341, 343 provided in the form of holding the liquid discharge port 342 therebetween, to form the liquid droplets of the pure water with the collision of the pure water with the nitrogen gas. The nitrogen gas is discharged into a liquid flow of the pure water via two different passages so as to be held therebetween, to operate shearing force on the pure water. Additionally, the nitrogen gas is discharged perpendicularly to the liquid flow of the pure water even in both gas discharge passages, therefore further increasing the shearing force. As a result, the fine liquid droplets are formed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009088079(A) 申请公布日期 2009.04.23
申请号 JP20070253337 申请日期 2007.09.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TANAKA TAKAYOSHI
分类号 H01L21/304;B05B7/06;B05D1/26;B08B3/02;G02F1/13;G02F1/1333;H01L21/027 主分类号 H01L21/304
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