发明名称 EXPOSURE APPARATUS, METHOD OF MANUFACTURING DEVICE, METHOD APPLIED TO EXPOSURE APPARATUS AND COMPUTER-READABLE MEDIUM
摘要 <p>An exposure device for exposing a substrate, a method for preparing a device, a method used in the exposure device, and a medium capable of being read by a computer are provided to improve the determination of the condition of the position detection of an alignment mark. An exposure device(1) comprises a stage(410) which holds a substrate(408); a detection unit(10) which detects the position of the alignment mark formed on the substrate held by the stage; a controller(405) which controls the position of the stage and the operation of the detection unit; and a computer terminal(407) which is connected with the controller, wherein the substrate is exposed according to the position detected by the detection unit and the position detection condition of the detection unit is determined based on the alignment error at the exposed substrate.</p>
申请公布号 KR20080078585(A) 申请公布日期 2008.08.27
申请号 KR20080016051 申请日期 2008.02.22
申请人 CANON KABUSHIKI KAISHA 发明人 MORIMOTO OSAMU
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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