TEMPERATURE CONTROL DEVICE FOR TARGET SUBSTRATE, TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS INCLUDING SAME,申请号KR20080106009-传众专利搜索

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发明名称	TEMPERATURE CONTROL DEVICE FOR TARGET SUBSTRATE, TEMPERATURE CONTROL METHOD AND PLASMA PROCESSING APPARATUS INCLUDING SAME
摘要
申请公布号	KR20090045857(A)	申请公布日期	2009.05.08
申请号	KR20080106009	申请日期	2008.10.28
申请人	TOKYO ELECTRON LIMITED	发明人	NONAKA RYO;MURAKAMI KOICHI
分类号	H01L21/324	主分类号	H01L21/324
代理机构		代理人
主权项
地址

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