| 摘要 |
<p>An exposure apparatus and a method for manufacturing a device are provided to improve throughput of the exposure apparatus which executes multiple exposure of a substrate in a lot to light using a plurality of reticles. An exposure apparatus comprises a reticle stage, a calculator(1), and a controller(2). The reticle stage is configured to hold a reticle, and executes multiple exposure of a substrate in a lot of light using a plurality of reticles. The calculator is configured to calculate a conveyance time taken to convey each of the plurality of reticles to the reticle stage, based on arrangement of the plurality of reticles before start of a process of the lot. The controller is configured to determine a sequence in which the plurality of reticles are used, based on the conveyance times of the plurality of reticles calculated by the calculator.</p> |
