发明名称 Semiconductive polymide film and process for production thereof
摘要 A polyamide acid solution and/or gel film is subjected to at least any one of the following processes: addition of a semiconducting inorganic filler, addition of a conductivity imparting agent, and formation of a conductive film. Thereafter, the polyamide acid contained in the polyamide acid solution or gel film is imidized. Thus, the obtained semiconducting polyimide film has surface and volume resistances satisfactorily controllable and less dependent on voltage, excellent mechanical properties, and a high elongation rate.
申请公布号 US7416695(B2) 申请公布日期 2008.08.26
申请号 US20030479543 申请日期 2003.12.03
申请人 KANEKA CORPORATION 发明人 KANESHIRO HISAYASU;NISHIKAWA YASUSHI;AKAHORI KIYOKAZU
分类号 B29C35/02;B28B5/00;C07C37/20;C08J5/18 主分类号 B29C35/02
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