CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND CLEANING METHOD OF SEMICONDUCTOR DEVICE

摘要

A cleaning apparatus for a semiconductor device is provided to improve reliability of a semiconductor device by preventing a metal structure of a semiconductor device from being corroded in a cleaning process. A semiconductor device(30) and a cleaning solution are contained in a cleaning tank(10). A plurality of anodic metals(15) of a plate type are attached to the inside of the cleaning tank to function as a sacrificial anode, attached to at least one surface of the cleaning tank. The anodic metal can be incorporated with the cleaning tank regardless of the number of layers of a metal interconnection formed in the semiconductor device.