Alkali developable multifunctional oligomer for photoresist, and process for preparing the same,申请号KR20070003469-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Alkali developable multifunctional oligomer for photoresist, and process for preparing the same
摘要
申请公布号	KR100854133(B1)	申请公布日期	2008.08.26
申请号	KR20070003469	申请日期	2007.01.11
申请人		发明人
分类号	C08F216/02;C08F214/00;C08F220/00;C08F246/00	主分类号	C08F216/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Fusing system with T-type amino functional silicone release agent

Tow bar assembly

Lock and release mechanism for fifth wheel

Closure system with adjustable sensitivity

Battery adapter

FUEL CONTROL VALVE

Graphics display system using tiles of data

Call billing and measurement methods for redirected calls

Method of decontaminating a PWR primary loop

Optical disk and optical disk recording and reproducing apparatus

Synchronous digital hierarchy 2-fiber ring having a selective protection function

Tracking controller for correcting a tracking error offset

X-ray apparatus

System for managing LSI design part data

Compound surface-charging electrode

Reverse battery protection device containing power MOSFET

Method and apparatus for measuring angular velocity of a transparent object

Apparatus and method for examining key plates

Emergency exit bar with dual sensors